Tantalum pentafluoride (TaF5) is a white crystal with strong refractive ability at room temperature, its relative molecular mass is 276, melting point is 96.8℃, boiling point is 229.5℃. Tantalum pentafluoride is slightly soluble in hot solution of carbon disulfide and carbon tetrachloride, it is soluble in water and ether, hydrofluoric acid, nitric acid, it is hygroscopic in air without hydrolysis. High pure tantalum pentafluoride is used in the microelectronics industry for chemical vapor deposition of tantalum silicide or tantalum film, in order to produce interconnects and grid electrode with low resistance and high melting point. Tantalum pentafluoride can form insulation film with strong adhesion, thickness of 0.1 μm, and a high dielectric constant on the surface of the electronic components, semiconductor devices, titanium, metallic nitride electrode and metal tungsten.
产品指标 Quality specification
项目Items
单位Units
指标Index
五氟化钽Tantalum pentafluoride≥
Vol.%
99.9
四氟化碳Carbon tetrafluoride(CF4)≤
Vol.ppm
10
氮气Nitrogen(N2)≤
Vol.ppm
50
(氧+氩)Oxygen+Argon(O2+Ar)≤
Vol.ppm
50
六氟化硫Sulfur hexafluoride(SF6)≤
Vol.ppm
10
四氟化硅Silicon tetrafluoride(SiF4)≤
Vol.ppm
10
氟化氢Hydrogen fluoride(HF)≤
Vol.ppm
800
产品用途 Application
五氟化钽在电子工业中用作化学气相淀积硅化钽或钽膜,制作低电阻、高熔点的电路互连线和栅极。
Tantalum pentafluoride is used in the microelectronics industry for chemical vapor deposition of tantalum silicide or tantalum film, in order to produce interconnects and grid electrode with low resistance and high melting point.
Tantalum pentafluoride is stored in s with packing specifications of 4.64L/10.2L/44L, the specific packaging specifications can be customized according to user requirements. Tantalum pentafluoride is stored in a shady and dry storeroom.